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A Simple and Scalable Graphene Patterning Method and Its Application in CdSe Nanobelt/Graphene Schottky Junction Solar Cells
Graphene Patterning Method Graphene Schottky Junction Solar Cells
2010/11/24
We have developed a simple and scalable graphene patterning method using electron-beam lithography (EBL) or ultraviolet (UV) lithography followed by a lift-off process. This method is free from additi...
Application of PMA Towards Moderating the Charge Storage Capability of MIS Memory Cell Based on PECVD Deposited Silicon Nitride Thin Films
PECVD Nitride films C-V G-V I-V P M A hysteresis and memory window
2010/4/9
A memory capacitor formed from Al/Si3N4/Si was prepared by means of trapping and de trapping mechanism of the dielectric films. Charge trapping and interface state characteristics of silicon nitride (...
Formation of Hot Zone By The Application of An Electric Field To Superconducting Bi1.6Pb0.4Sr2Ca3Cu4Ox (2234) Rod
Bi-Pb-Sr-Ca-Cu-O superconducting phase
2010/4/16
The formation of hot zone by electric field on superconducting Bi-Pb-Sr-Ca-Cu-O (BSCCO) rods is described. Bulk samples with a nominal composition of Bi1.6Pb0.4Sr2Ca3Cu4Ox (2234) were prepared as rods...
