工学 >>> 力学 农业工程 林业工程 工程与技术科学基础学科 测绘科学技术 材料科学 矿山工程技术 石油与天然气工程 冶金工程技术 机械工程 光学工程 仪器科学与技术 动力与电气工程 能源科学技术 核科学技术 电子科学与技术 信息与通信工程 控制科学与技术 计算机科学技术 化学工程 纺织科学技术 印刷工业 服装工业、制鞋工业 轻工技术与工程 食品科学技术 土木建筑工程 水利工程 交通运输工程 船舶与海洋工程 航空、航天科学技术 兵器科学与技术 环境科学技术 安全科学技术 工业设计
搜索结果: 1-11 共查到工学 Lithography相关记录11条 . 查询时间(0.073 秒)
Photonic chips have revolutionized data-heavy technologies. On their own or in concert with traditional electronic circuits, these laser-powered devices send and process information at the speed of li...
Optical Proximity Correction (OPC) is a part of a family of techniques called Resolution Enhancement Techniques (RET). These techniques are employed to increase the resolution of a lithography system ...
A single-beam interference-lithography scheme is demonstrated for the fabrication of large-area slant gratings, which requires exposure of the photoresist thin film spin-coated on a glass plate with p...
First noted in 1965, Moore's law describes the trend of increasing computer technology, which has continued for more than 50 years and is expected to keep going for decades more in the semiconductor i...
Bolstered by a record 2010 and continued indicators predicting market growth for the industry, the lithography community is preparing for its annual gathering at SPIE Advanced Lithography. Finding sol...
Highly ordered metallic nanostructures have attracted an increasing interest in nanoscale electronics, photonics, and spectroscopic imaging. However, methods typically used for fabricating metallic na...
Low loss thermally nanoimprinted chalcogenide waveguides are demonstrated for the first time,uniquely using a soft PDMS stamp. Losses of 0.24dB/cm at 1550nm limited by Rayleigh scattering were achieve...
Digital lithography technique is a promising tool for the fabrication of binary optical element. In this paper, we present the mask-division technique to improve the lithography quality. A piece of ...
We describe properties of laser produced plasmas (LPP) for extreme ultra violet (EUV) light source for next generation lithography as an industrial application of LPP. We briefly present three topics ...
A simplified nanosphere lithography process has been developed which allows fast and low-waste maskings of Si surfaces for subsequent reactive ion etching (RIE) texturing. Initially, a positive surfac...
In micro-electronic and micro-optical manufacturing, especially in the fabrication of linewidth-variation-sensitive devices, we sometimes care getting stable or precise linewidth rather than creating ...

中国研究生教育排行榜-

正在加载...

中国学术期刊排行榜-

正在加载...

世界大学科研机构排行榜-

正在加载...

中国大学排行榜-

正在加载...

人 物-

正在加载...

课 件-

正在加载...

视听资料-

正在加载...

研招资料 -

正在加载...

知识要闻-

正在加载...

国际动态-

正在加载...

会议中心-

正在加载...

学术指南-

正在加载...

学术站点-

正在加载...