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2018年SPIE极紫外光刻会议（SPIE Extreme Ultraviolet (EUV) Lithography IX）。
2017国际极紫外光刻会议（International Conference on Extreme Ultraviolet Lithography 2017）
2017 国际极紫外光刻 会议
2017/7/6
The 2017 EUVL Conference, organized by SPIE, EUREKA, imec, and EIDEC, provides a forum to discuss and assess the worldwide status of EUVL technology and infrastructure readiness, as well as opportunit...
Review conference details by clicking on the titles below. These details include paper titles, authors, schedules and abstracts. View Proceedings from last year.SPIE conference papers are published in...
A simple, unifying model of the extreme Ultraviolet spectra of dwarf novae in outburst
extreme Ultraviolet spectra dwarf novae outburst
2009/6/17
A simple, unifying model of the extreme Ultraviolet spectra of dwarf novae in outburst。
Cataloguing emission line spectra from fe vii-fe XXIV in the extreme ultraviolet
emission line spectra extreme ultraviolet fe vii-fe XXIV
2009/6/4
Cataloguing emission line spectra from fe vii-fe XXIV in the extreme ultraviolet。
Development of Extreme-Ultraviolet Light Source by Laser-Produced Plasma
Laser produced plasma Extreme Ultraviolet (EUV) Tin opacity
2009/6/1
Extreme ultraviolet (EUV) radiation from laser-produced plasma has been studied for mass-production of the next generation semiconductor devices with EUV lithography. A full set of experimental databa...
Development of Extreme-Ultraviolet Light Source by Laser-Produced Plasma
Laser produced plasma Extreme Ultraviolet (EUV) Tin opacity
2009/6/1
Extreme ultraviolet (EUV) radiation from laser-produced plasma has been studied for mass-production of the next generation semiconductor devices with EUV lithography. A full set of experimental databa...
STARK BROADENING PARAMETER TABLES FOR LARGE QUANTUM NUMBER C IV UV LINES OF INTEREST FOR EXTREME ULTRAVIOLET EXPLORER MISSION
STARK BROADENING PARAMETER TABLES EXTREME ULTRAVIOLET QUANTUM NUMBER C IV UV LINES
2009/4/22
STARK BROADENING PARAMETER TABLES FOR LARGE QUANTUM NUMBER C IV UV LINES OF INTEREST FOR EXTREME ULTRAVIOLET EXPLORER MISSION。
Metrology of Mo/Si multilayer mirrors at 13.5 nm with the use of a laser-produced plasma extreme ultraviolet (EUV) source based on a gas puff target
laser-produced plasma extreme ultraviolet (EUV) source
2011/5/3
In this paper an application of a recently developed laser plasma source of extreme ultraviolet (EUV) for optical measurements of optical characteristics of Mo/Si multilayer mirrors is presented. The ...
The Extreme Ultraviolet Emission Lines of Some Cataclysmic Variables at Outburst
Emission lines accretion disks and Cataclysmic Variables
2010/4/9
Using spectral technique, analyses of some astrophysical data from the EUVE satellite in the Extreme Ultraviolet region on accretion disk of some cataclysmic variable were carried out. A number of str...
Magnetic Activity in the Extreme Ultraviolet
ultraviolet cool stars astronomical observations
2010/4/16
The wealth of astronomical observations obtained in the extreme ultraviolet in recent years, have allowed comprehensive studies of the stellar transition regions and coronae to be carried out. For the...
