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Extreme ultraviolet (EUV) radiation from laser-produced plasma has been studied for mass-production of the next generation semiconductor devices with EUV lithography. A full set of experimental databa...
The plasma clean in a plasma-enhanced chemical vapor deposition (PECVD) system plays an important role to ensure the same chamber condition after numerous film depositions. The periodic and applicable...
The extension in length for open microstrip configuration in plasma media is determined using spectral domain technique under quasi static approach [1, 2]. The results were verified by modifying Hamme...
The effect of plasma on the radiation characteristics of curved rectangular microstrip antenna is studied by means of a new plasma simulation technique. Unlike previous techniques [1,2], a relative in...
The radiation properties of a microstrip antenna immersed in an ionized medium have since been studied using potential function technique and linearized hydrodynamic theory. In the present paper, Vect...
This paper is devoted to the analysis of the Plasma-Optical Effect in GaAs PIN photodiodes operating at the infrared range. An approximated expression for the variation of the refractive index in the ...
The arc plasma spraying process was applied to obtain ceramic coatings on stainless steel substrates. The outer coatings were formed from pure alumina or alumina + 2 wt. % titania mixture. The nichrom...

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