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Atmospheric Pressure Deposition of Silica Thin Film by Photo-CVD Using Vacuum Ultraviolet Excimer Lamp
Excimer lamp Silica thin film TEOS
2009/6/8
It has been known that thin silica films can be deposited from TEOS {Si(OC2H5)4} by means of the photo-CVD (Chemical Vapor Deposition) technique using vacuum ultraviolet (VUV) light (VUV-CVD) at room ...
